Parallel Computational Fluid Dynamics 2003: Advanced Numerical Methods, Software and Applications
The book is devoted to using of parallel multiprocessor computer systems for numerical simulation of the problems which can be described by the equations of continuum mechanics. Parallel algorithms and software, the problems of meta-computing are discussed in details, some results of high performance simulation of modern gas dynamic problems, combustion phenomena, plasma physics etc are presented.
Plasma Charging Damage
This book provides an in-depth, comprehensive and up-to-date coverage of the subject of plasma charging damage in modern VLSI circuit manufacturing. It is written for beginners as well as practitioners. For beginners, this book presents an easy-to-follow, unified explanation of various charging-damage phenomena, the goal being to provide them with a solid foundation for taking on real damage problems encountered in VLSI manufacturing. For practitioners, it can help bridge the gap between disciplines by providing all of the necessary background materials in one place.Drawing on the author's wide range of experience in plasma science, processing technologies, device physics and reliability physics, the text includes information on: - plasma and mechanisms of plasma damage; - wear-out and breakdown of thin gate-oxides; - the impact of processing equipment on damage; - methods of damage measurement; - damage management; - gate-oxide scaling.
Plasma Charging Damage 
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Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science....
Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759
Plasma tv > Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759
Plasma Physics for Astrophysics
"Russell Kulsrud has written an outstanding text that should raise the appreciation of plasma astrophysics within the general astronomy community at a time when the influence of plasma processes on what we observe is recognized to be of paramount importance."--Roger D. Blandford, Kavli Institute for Particle Astrophysics and Cosmology, Stanford University
"Perhaps the most important feature of this book is its pedagogical approach: its emphasis of physical understanding over detailed mathematics. Simple estimates and examples are given instead of rigorous derivations (rigorous results are then quoted). The writing is colloquial and accessible. This is an excellent approach, and it helps demystify a complex subject. Indeed, it is an approach that is lacking in many existing texts in the field.
Plasma Physics for Astrophysics
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Transport Phenomena in Partially Ionized Plasma by Vladimir A. Rozhansky, ISBN 9056990381
Transport phenomena in plasmas are the relatively slow process of particle, momentum and energy transport in systems in a state of mechanical equilibrium. In contrast to neutral gases, these phenomena in plasmas are greatly influenced by self-consistent fields in particular electric fields. These can produce particle and energy fluxes, in addition to those generated by the homogeneity of the plasma composition and temperature. As a result, the physical effects accompanying transport phenomena in plasmas are far more numerous and complicated than those in neutral gases, and the solution of corresponding problems is more difficult. The effects however, are usually far more interesting and sometimes surprising.
Presenting a systematic survey and analysis of the main mechanism of transport phenomena in plasma this book also gives examples of gradually increasing complexity to illustrate these mechanisms and the relationships between them. Special attention is paid to the analysis of experimental...
Transport Phenomena in Partially Ionized Plasma by Vladimir A. Rozhansky, ISBN 9056990381
Plasma tv > Transport Phenomena in Partially Ionized Plasma by Vladimir A. Rozhansky, ISBN 9056990381
Fundamentals of Plasma Physics
Fundamentals of Plasma Physics is a general introduction designed to present a comprehensive, logical and unified treatment of the fundamentals of plasma physics based on statistical kinetic theory, with applications to a variety of important plasma phenomena. Its clarity and completeness makes the text suitable for self-learning and for self-paced courses.
Throughout the text the emphasis is on clarity, rather than formality, the various derivations are explained in detail and, wherever possible, the physical interpretations are emphasized. The mathematical treatment is set out in great detail, carrying out the steps which are usually left to the reader. The problems form an integral part of the text and most of them were designed in such a way as to provide a guideline, stating intermediate steps with answers.
Fundamentals of Plasma Physics
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Inductively Coupled Plasma-Mass Spectroscopy: Practices and Techniques by Howard E. Taylor, ISBN 0126838658
Inductively Coupled Plasma-Mass Spectrometry presents a concise A-Z description of inductively coupled plasma-mass spectrometry, written in layman's terms, for use in the solution of trace element analytical chemistry problems. Detailed discussion of sample introduction and data interpretation is provided.
Practicing analytical chemists will be able to use this text to familiarize themselves with the principles, approaches, options, pitfalls, and advantages of ICP-MS technology.
Inductively Coupled Plasma-Mass Spectroscopy: Practices and Techniques by Howard E. Taylor, ISBN 0126838658
Plasma tv > Inductively Coupled Plasma-Mass Spectroscopy: Practices and Techniques by Howard E. Taylor, ISBN 0126838658
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